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Tenders For euv lithography

Ref No Posting Date Deadline Location Value Short Description
2271616261031 31-Oct-2026 19-Nov-2026 China Refer Document. Tender For Procurement Project for a Contact Lithography Machine at the Shanghai Institute of Optics and Fine Mechanics,
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630117261030 30-Oct-2026 02-Nov-2026 Belarus BYN 92529 Tender For Reconstruction of the ground-floor premises of the lithography building
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624616261030 30-Oct-2026 17-Nov-2026 China Refer Document. Tender For University of Aeronautics and Astronautics maskless lithography machine purchase
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3057516261030 30-Oct-2026 N/A Spain Refer Document. Tender For Preliminary market consultation regarding the supply of ten pieces of equipment for microelectronics research intended for the Malaga Semiconductor Center (Group 2).
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3133816261029 29-Oct-2026 18-Nov-2026 China Refer Document. Tender For Ultra-fast transient absorption microscopy system, maskless nano lithography machine
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173051261027 27-Oct-2026 25-Nov-2026 China Refer Document. Tender For procurement of electron beam lithography microscopy imaging system
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1550916261027 27-Oct-2026 10-Nov-2026 Spain EUR 465000 Tender For Supply of lithography system by direct laser writing
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2859516261023 23-Oct-2026 23-Nov-2026 Germany Refer Document. Tender For Electron beam lithography
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2859716261023 23-Oct-2026 24-Nov-2026 France Refer Document. Tender For SUPPLY OF AN ELECTRONIC LITHOGRAPHY SYSTEM
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4719416261023 23-Oct-2026 N/A Switzerland Refer Document. Tender For Wet workbenches for FIRST II in the new ETH HPQ building
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5222816261023 23-Oct-2026 23-Nov-2026 Germany Refer Document. Tender For Electron beam lithography
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5292916261023 23-Oct-2026 24-Nov-2026 Germany Refer Document. Tender For Electron beam lithography
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4982716261022 22-Oct-2026 06-Nov-2026 Ukraine Refer Document. Tender For Microplates for determining the susceptibility of microorganisms to antibiotics
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2387316261021 21-Oct-2026 06-Nov-2026 China Refer Document. Tender For University of Science and Technology of China Maskless Lithography Project
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1851016261017 17-Oct-2026 03-Nov-2026 China Refer Document. Tender For Key Laboratory of Micro/Nano Fabrication Technology contact-proximity UV lithography machine procurement project
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4378816261017 17-Oct-2026 06-Nov-2026 India / MAHARASHTRA Refer Document. Tender For Direct Writing Lithography System
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2731116261015 15-Oct-2026 11-Nov-2026 India / punjab INR 32730000 Tender For Supply, Installation, testing and commissioning of Maskless Direct-Write Lithography System with accessories-1724-2-GTE
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2990716261014 14-Oct-2026 24-Nov-2026 Denmark Refer Document. Tender For Delivery and installation of an ICP Reactive Ion Etcher
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1668316261013 13-Oct-2026 10-Nov-2026 Sweden Refer Document. Tender For Deep Reaction Ion Etcher (DRIE)
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3346716261013 13-Oct-2026 23-Nov-2026 Denmark Refer Document. Tender For Delivery and installation of an ICP reactive ion etcher for silicon dielectrics
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650916261012 12-Oct-2026 16-Nov-2026 Germany Refer Document. Tender For S_Direct_Illuminator_SP
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2186316261010 10-Oct-2026 09-Nov-2026 Sweden Refer Document. Tender For Deep Reaction Ion Etcher (DRIE)
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2194816261010 10-Oct-2026 05-Nov-2026 Sweden SEK 26000000 Tender For Electron Beam Lithography (EBL) Tool
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3917616261010 10-Oct-2026 16-Nov-2026 Germany Refer Document. Tender For Design, supply, installation, commissioning, and acceptance/documentation of a new maskless lithography system that features high
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3217216261009 09-Oct-2026 10-Nov-2026 Sweden Refer Document. Tender For Industrial machinery
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3446016261009 09-Oct-2026 05-Nov-2026 Sweden SEK 26000000 Tender For Electron Beam Lithography (EBL) Tool
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12618516261007 07-Oct-2026 12-Nov-2026 Switzerland Refer Document. Tender For reactive ion plasma etching equipment for metals for the MicroNanoTechnology Center
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3832916261005 05-Oct-2026 10-Nov-2026 Switzerland Refer Document. Tender For Ultra-high Resolution Electron-beam Lithography System
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3712516261005 05-Oct-2026 11-Nov-2026 Switzerland Refer Document. Tender For Electron-beam Lithography System
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3228116260612 12-Jun-2026 N/A Germany EUR 510000 Tender For Maskless Laser Lithography System
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