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Tenders For lithography

Ref No Posting Date Deadline Location Value Short Description
372417250517 17-May-2025 16-Jun-2025 Germany Refer Document. Tender For Nanolithography System
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694916250517 17-May-2025 28-May-2025 United States Refer Document. Tender For Silicon Wafers with Multiple Thin Films
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3234216250516 16-May-2025 23-Jun-2025 Philippines PHP 3557016 Tender For PROCUREMENT OF CONSULTING SERVICES FOR THE APPRAISAL OF ONE (1) LOT OF VARIOUS PAINTINGS AND ARTWORKS
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1848916250516 16-May-2025 03-Jun-2025 Sweden Refer Document. Tender For Direct writing laser lithography system
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1008017250515 15-May-2025 09-Jun-2025 Spain Refer Document. Tender For Supply and installation of a three-dimensional structure manufacturing system using two-photon laser lithography polymerization
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1407116250515 15-May-2025 16-Jun-2025 Germany Refer Document. Tender For Nanolithography system
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1299416250514 14-May-2025 02-Jun-2025 Japan Refer Document. Tender For High speed wide area eb lithography system 1 set
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1267916250509 09-May-2025 09-Jun-2025 Spain Refer Document. Tender For Supply and installation of a three-dimensional structure manufacturing system
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728316250508 08-May-2025 05-Jun-2025 Germany Refer Document. Tender For created using lithographic processes on 4-inch wafers
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1738816250507 07-May-2025 05-Jun-2025 Germany Refer Document. Tender For Maskless Aligner
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2785716250424 24-Apr-2025 26-May-2025 Spain Refer Document. Tender For Production and supply of prints, reprographic material, roll-ups and photographic printing of lithographs and canvases
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2060516250417 17-Apr-2025 05-Jun-2025 Japan Refer Document. Tender For I line maskless lithography system 1 set
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2846316250312 12-Mar-2025 31-May-2025 France Refer Document. Tender For Supply of a maskless UV lithography system for the manufacture of electrodes on diamond anvils
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1231418241023 23-Oct-2024 N/A Belgium Refer Document. Tender For Framework agreement for the supply of lithographic masks
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1319116240408 08-Apr-2024 N/A Czech Republic Refer Document. Tender For Electron beam lithograph 100 kV/Electron beam lithograph 100 kV
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